Thin-Film Deposition: Principles and Practice
Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However much of the available thin film literature is based on empirical knowledge and focuses only on specific processes or applications.
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adsorbed adsorption alloy angle atoms beam becomes behavior bonding bulk cathode chemical Chemical Vapor Deposition chemisorption coefficient collision composition compound concentration condensation contamination crystal decreases density deposition process deposition rate diffraction discussed in Sec dislocation dissociation dopant downstream electrical electron element ellipsometry emission epitaxy equation equilibrium factor Figure film deposition flow flux fraction frequency GaAs gases geometry Gibbs free energy growth heat impinging increases interface ion bombardment ionization kinetic energy lattice layer mass material mean free path measured metal molecular Molecular Beam Epitaxy molecules monolayer nucleation nuclei occurs particles phase Phys plane plasma potential pressure pump ratio reactant reaction reactive reactor regime result semiconductors sheath shown in Fig SiH4 solid species sputtering sticking coefficient stress structure substrate surface diffusion susceptor target techniques Technol tensile stress thermal thickness thin-film thin-film deposition tion typical vacuum vapor velocity voltage
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