Thin-Film Deposition: Principles and PracticePublisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product. |
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adsorbed adsorption alloy angle atoms beam becomes behavior bonding boundary bulk cathode chemical Chemical Vapor Deposition chemisorption coefficient collision composition compounds concentration condensation contamination crystal decreases density deposition process deposition rate diffraction discussed in Sec dislocation displacement dissociation dopant electron element ellipsometry emission epilayer epitaxy equation equilibrium factor Figure film deposition flow flux fraction GaAs gases geometry Gibbs free energy growth heat impinging increase interface ion bombardment ionization kinetic energy laser lattice layer mass material metal mole molecular Molecular Beam Epitaxy molecules monolayer nucleation nuclei occurs particles phase Phys plane plasma potential pressure pump ratio reactant reaction reactive reactor regime result RHEED semiconductors sheath shown in Fig solid species sputtering sticking coefficient stress structure substrate surface diffusion susceptor target techniques tensile stress thermal thickness thin-film deposition tion typical vacuum vapor velocity voltage