Statistical Case Studies for Industrial Process ImprovementThis book contains a broad selection of case studies written by professionals in the semiconductor industry that illustrate the use of statistical methods to improve manufacturing processes. These case studies offer engineers, scientists, technicians, and managers numerous examples of best-in-class practices by their peers. Because of the universal nature of statistical applications, the methods described here can be applied to a wide range of industries, including the chemical, biotechnology, automotive, steel, plastics, textile, and food industries. Many industries already benefit from the use of statistical methods, although the semiconductor industry is considered both a leader in and a model for the wide application and effective use of statistics. |
Contents
SA01_ch18 | 251 |
SA01_ch19 | 265 |
SA01_ch20 | 283 |
SA01_ch21 | 299 |
SA01_ch22 | 315 |
SA01_ch23 | 325 |
SA01_ch24 | 337 |
SA01_ch25 | 359 |
SA01_ch9 | 105 |
SA01_ch10 | 115 |
SA01_ch11 | 133 |
SA01_ch12 | 145 |
SA01_ch13 | 155 |
SA01_ch14 | 171 |
SA01_ch15 | 199 |
SA01_ch16 | 213 |
SA01_ch17 | 235 |
SA01_ch26 | 365 |
SA01_ch27 | 387 |
SA01_ch28 | 403 |
SA01_ch29 | 427 |
SA01_ch30 | 429 |
SA01_appendix | 469 |
SA01_backmatter | 477 |
Other editions - View all
Statistical Case Studies for Industrial Process Improvement Veronica Czitrom,Patrick D. Spagon Limited preview - 1997 |
Statistical Case Studies for Industrial Process Improvement Veronica Czitrom,Patrick D. Spagon No preview available - 1987 |
Statistical Case Studies for Industrial Process Improvement Veronica Czitrom,Patrick D. Spagon No preview available - 1997 |
Common terms and phrases
alignment analysis Appendix applied availability average calculated Chapter circuit combinations computed considered continuous control charts control limits corresponding data collection deposition designed experiment determine distribution effects engineering equipment error estimate etch example experiment experimental factors failure Figure film first flow four fractional furnace gauge given gives graph illustrates important improvement increases indicates interactions levels lots manufacturing mean measurement methods needed normal observations obtained operator oxide parameters pattern performance plot points pressure probability problem random range ratio reliability removal replacement residual response sample selected SEMATECH semiconductor shows significant sources specification squares standard deviation statistical step Table temperature thickness tool tungsten uniformity unit values variability variance variance components variation wafer